Study on the disinfection effect of a new 222 nm far-UVC radiation

HAN Jie; SHA Si-shuo; LI Jin; XU Chun; SHAO Zi-xuan; REN Zhe; ZHANG Xue; WEI Qiu-hua

doi:10.11726/j.issn.1001-7658.2023.10.001

HAN Jie, SHA Si-shuo, LI Jin, XU Chun, SHAO Zi-xuan, REN Zhe, ZHANG Xue, WEI Qiu-hua

CHINESE JOURNAL OF DISINFECTION ›› 2023, Vol. 40 ›› Issue (10) : 721-724.

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CHINESE JOURNAL OF DISINFECTION ›› 2023, Vol. 40 ›› Issue (10) : 721-724. DOI: 10.11726/j.issn.1001-7658.2023.10.001

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Study on the disinfection effect of a new 222 nm far-UVC radiation

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2023, 40(10): 721-724 https://doi.org/10.11726/j.issn.1001-7658.2023.10.001

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Received	Published
2023-05-19	2023-10-15
Issue Date
2023-10-18

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